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ST11192 Indium Tin Oxide Rotary Target, ITO Target

Catalogue Number ST11192
Composition In2O3, SnO2
Purity ≥99.99%, or customized
Form Target
Shape Tubular
Dimensions Customized

Indium Tin Oxide Rotary Target, ITO Target is manufactured using a controlled blending of indium and tin oxides to support uniform sputtering performance. Stanford Advanced Materials (SAM) utilises rigorous quality assessments including spectroscopic analysis and routine material homogeneity checks. Their process emphasises reproducibility and tight composition control to support precise film deposition required for semiconductor and optoelectronic applications.

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FAQ

What role does the rotary design play in sputtering performance?

The rotary design minimises localised heating and target erosion by promoting even material consumption. This ensures stable deposition rates and improved film uniformity, critical in applications such as display and solar cell manufacturing.

How is the material composition verified during production?

The composition is verified using spectrometric techniques and batch-to-batch chemical analysis. This testing minimizes deviation in the indium-to-tin ratio and ensures consistent target properties under high-power sputtering conditions.

Can the customised dimensions affect installation compatibility?

Yes, the customised dimensions allow adaptation to various sputtering systems. Customers should specify their equipment requirements to ensure compatibility with deposition chambers and maintain process consistency. For further details, please contact us.

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