ST11199 Niobium Pentoxide Planar Target, Nb2O5 Target

Niobium Pentoxide Planar Target, Nb2O5 Target Description

Niobium Pentoxide Planar Target, Nb2O5 Target is engineered for sputtering applications in thin film deposition. With its planar structure, the target facilitates even material transfer and minimises local density variations. The high purity Nb2O5 composition supports controlled deposition of films used in electronic and catalytic systems. Its tailored dimensions allow compatibility with standard sputtering equipment, providing a consistent interface for experimental and industrial processes.

Niobium Pentoxide Planar Target, Nb2O5 Target Characteristics

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Niobium Pentoxide Planar Target, Nb2O5 Target Applications

Electronics
- Used as a sputtering target in deposition systems for fabricating thin conductive or dielectric layers to achieve uniform film quality by utilising its high surface homogeneity.

Catalyst Production
- Applied as a precursor in catalyst formulation to enhance reaction efficiency by utilising its chemical stability and precise compositional control.

Material Research
- Used as a research substrate in advanced materials laboratories to study the optical and electrical properties of niobium compounds by utilising its controlled planar geometry.

Niobium Pentoxide Planar Target, Nb2O5 Target Packing

The target is packaged in cleanroom-grade protective casings lined with inert foam to minimise mechanical stress and contamination risks. It is sealed in an anti-static, contamination-resistant wrap and stored in a temperature-controlled container. Custom packaging configurations, including tailored compartment designs and labelling, are available. Proper storage in a dry, controlled environment is recommended to maintain the target's integrity.

Additional Information

Transition metal oxides such as Nb2O5 play a significant role in sputtering processes due to their stable chemical and thermal properties. Their controlled synthesis and dimensional adjustments are vital for enabling precise film deposition in semiconductor and catalyst applications.

Understanding the crystallographic and phase properties of niobium pentoxide contributes to advancements in material science. As research continues, refinements in processing techniques further enhance its performance in both industrial and laboratory settings.