ST11218 Vanadium Rotary Target, V Target

Vanadium Rotary Target, V Target Description

Vanadium Rotary Target, V Target is a sputtering target manufactured from high-purity vanadium (atomic weight 50.94 g/mol) that employs a rotary mechanism to achieve uniform erosion during deposition. The design supports precise film thickness control and reduces localized wear. Its customisable dimensions ensure integration with standard sputtering systems, providing an effective solution for consistent thin film processing.

Vanadium Rotary Target, V Target Characteristics

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Vanadium Rotary Target, V Target Applications

Industrial Sputtering Applications
- Used as a sputtering target in thin film deposition systems to achieve uniform film coverage by leveraging its rotary design, which evenly distributes erosion and enhances process stability.
- Applied in semiconductor processing equipment to minimise localized sputter damage and improve overall deposition uniformity.

Research and Development
- Employed as a test sample in sputtering experiments to study material erosion dynamics, with its customisable dimensions facilitating tailored experimentation.
- Used as a benchmark material in process optimisation studies due to its predictable erosion and deposition characteristics.

Vanadium Rotary Target, V Target Packing

Vanadium Rotary Target, V Target is packaged in a sealed, anti-static container with built-in foam cushioning to reduce mechanical shock and prevent surface contamination. The packaging is designed for controlled storage in a dry, temperature-regulated environment to minimise oxidation risks. Custom packaging options, including inert gas fills and special labeling, are available to meet specific handling requirements.

Additional Information

Vanadium, with its high melting point and distinct mechanical properties, is extensively utilised in applications that demand stable sputtering processes. Its resistance to thermal degradation and compatibility with high-vacuum environments make it a preferred material in advanced thin film deposition techniques.

Beyond sputtering targets, vanadium is also incorporated in alloy formulations and structural components where durability and controlled microstructure are essential. Researchers and engineers continue to explore its utility in various high-temperature and corrosive environments.