ST7953 Molybdenum Sputtering Target 99%, Dia. 2 inch

Molybdenum Sputtering Target 99%, Dia. 2 inch Description

This Molybdenum Sputtering Target, exhibiting 99% purity and a diameter of 2 inches, is designed to meet high-performance requirements in advanced manufacturing. Recognised for its exceptional mechanical strength, high melting point, and superior thermal conductivity, molybdenum stands out in demanding environments where reliability is essential. These properties make it an ideal choice for thin film deposition processes, particularly in semiconductor and electronics applications where precision and efficiency are critical.

Manufactured to stringent quality standards, this sputtering target undergoes rigorous inspection to ensure minimal impurities, uniform thickness, and consistent microstructure. By maintaining tight control over production parameters, it provides highly stable sputtering rates and reproducible outcomes across multiple coating cycles. Whether you are working on semiconductor devices, flat panel displays, or solar cell components, this Molybdenum Sputtering Target delivers a balance of purity, performance, and consistency essential for your most critical projects.

Molybdenum Sputtering Target 99%, Dia. 2 inch Applications

Molybdenum sputtering targets with 99% purity are valued for their mechanical and thermal properties, making them ideal for creating high-quality coatings in various industries. With a diameter of 2 inches, these targets deliver exceptionally uniform thin films while maintaining excellent corrosion resistance. They also possess outstanding electrical conductivity and hardness, supporting performance in critical applications ranging from electronic devices to advanced optical systems.

1. Thin Film Deposition Applications

·         PVD Coating: Utilises molybdenum’s high melting point and stability to produce thin films with excellent adhesion and uniform thickness.

·         Magnetron Sputtering: Ensures film consistency and enhances substrate coverage due to molybdenum’s high density and conductivity.

2. Semiconductor Applications

·         Integrated Circuits: Utilises molybdenum’s low resistivity and thermal stability for reliable interconnects, improving overall device performance.

·         Electronic Components: Benefits from molybdenum’s corrosion resistance and durability, maintaining integrity under demanding operating conditions.

3. Optical Coating Applications

·         Anti-reflective Coatings: Employs molybdenum’s capacity for precise film control, resulting in improved optical clarity.

·         Mirror Coatings: Utilises molybdenum’s hardness and reflectivity to deliver highly reflective and long-lasting mirror surfaces.

Molybdenum Sputtering Target 99%, Dia. 2 inch Packaging

Our Molybdenum Sputtering Target (99%, diameter of 2 inches) is carefully packed to ensure maximum protection. Each piece is individually wrapped with protective foam, then vacuum sealed to prevent dust and moisture infiltration. A specialised anti-oxidation layer is added to preserve purity during storage and transit. Packaging can be customised upon request, including specific labelling, additional cushioning, or adjusted dimensions according to your requirements.

Packaging: Vacuum sealed, Wooden Box, or Customised.

Molybdenum Sputtering Target 99%, Dia. 2 inch FAQs

Q1: What are the key material properties of Molybdenum Sputtering Target 99%, Dia. 2 inch?

A1: Molybdenum Sputtering Target 99%, Dia. 2 inch exhibits a high melting point (2,623°C) and excellent thermal and electrical conductivity. With a purity level of 99%, it offers stable mechanical behaviour and outstanding corrosion resistance in many environments. Its density of approximately 10.22 g/cm³ enhances its suitability for thin film deposition. The target’s homogeneous microstructure ensures uniform sputtering rates, which contributes to reliable, high-quality coating performance.

Q2: How can this Mo sputtering target be processed or fabricated?

A2: This Mo sputtering target is typically produced through a powder metallurgy process followed by forging or rolling to achieve its final dimensions. The starting molybdenum powder is compacted and sintered at high temperatures, ensuring optimal density and microstructure. Subsequent machining and polishing refine the target’s surface finish and flatness. These careful fabrication steps help maintain the material’s purity and promote consistent sputtering performance during thin film deposition.

Q3: Which quality standards and certifications apply to Molybdenum Sputtering Target 99%, Dia. 2 inch?

A3: These molybdenum sputtering targets are often produced under strict quality assurance systems, such as ISO 9001, to ensure material consistency and traceability. They may also conform to industry specifications like ASTM B523 for molybdenum rod and bar. Manufacturers typically provide certificates of analysis indicating purity, density, and mechanical properties. Rigorous inspections and testing guarantee uniform performance, reproducible results, and reliable thin film coatings.

Related Information

1. Raw Materials - Mo Materials

Mo is a valuable material used in various sputtering applications. It is extracted and purified through advanced processing operations. Stanford Advanced Materials sources high-grade materials from reliable suppliers, ensuring quality and consistency in our sputtering target products.

2. Sputtering Target Manufacturing

Several methods are used to produce Mo sputtering targets, including powder metallurgy. Each method results in different target characteristics such as density, grain structure, and surface properties. The manufacturing method is selected based on the intended application requirements and performance specifications.