ST7953 Molybdenum (Mo) Sputtering Target 99%, Dia. 2 inch

Molybdenum Sputtering Target 99%, Dia. 2 inch Description

Molybdenum is a refractory metal known for:

• High melting point (2623°C), enabling stable operation in severe sputtering environments.
• Very good thermal conductivity (139 W/m·K), providing effective heat dissipation.
• Low thermal expansion coefficient (4.8×10⁻⁶/K), minimising stress from thermal cycling.
• Excellent corrosion resistance, extending target service life.

Our molybdenum sputtering targets are sintered, forged/rolled, machined, and polished to achieve maximum density, smooth surface, and consistent sputtering performance. These characteristics position them ideally for applications in semiconductors, electronics, displays, and energy.

Molybdenum Sputtering Target 99%, Dia. 2 inch Specification

*Product specifications listed above are based on theoretical data and are for reference purposes only. Actual specifications are subject to variation.

Molybdenum Sputtering Target 99%, Dia. 2 inch Applications

• Semiconductors – Integrated circuits, interconnects, and high-performance electronic components.
• Thin Film Deposition – PVD and magnetron sputtering for uniform, durable coatings.
• Solar Cells – Back contact layers for CIGS and thin-film solar technologies.
• Flat Panel Displays (LCD, OLED, TFT) – Uniform, stable coatings for high-resolution displays.
• Optical Coatings – Anti-reflective layers and precision mirror coatings.

Molybdenum Sputtering Target 99%, Dia. 2 inch Packaging

Each molybdenum sputtering target is:

• Separately vacuum packed to prevent contamination.
• Protected with anti-oxidation coating and shock-absorbing foam.
• Shipped in wooden crate or special packaging for safe transport.

Molybdenum Sputtering Target 99%, Dia. 2 inch FAQs

Q1: What are the key properties of Molybdenum Sputtering Targets?

A1: High melting point, good thermal/electrical conductivity, corrosion resistance, and homogeneous microstructure to ensure stable sputtering.

Q2: How are SAM molybdenum targets manufactured?

A2: Powder metallurgy → sintering → forging/rolling → machining/polishing, ensuring density, purity, and flatness.

Q3: What purity levels are available?

A3: Standard purity is 99%. Higher purities (≥99.95%) are available upon request.

Q4: What is the difference between bonded and monolithic molybdenum targets?

A4: Bonded targets (Mo bonded to backing tube using indium/elastomer) are economical and all-purpose. Monolithic targets are single-piece, providing highest yield, stability, and longer life.

Inquiry

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Related Information

1. Raw Materials - Mo Materials

Mo is a valued resource and material used for various sputtering applications. It is extracted and processed through advanced processing operations. Stanford Advanced Materials buys high-quality materials from reputable sources with guarantees of quality and consistency in our sputtering target products.

2. Sputtering Target Manufacturing

There are several methods of producing Mo sputtering targets, such as powder metallurgy. There are different target properties obtained through each process, such as density, grain structure, and surface. The process of production is selected based on the application requirements as well as on the performance requirements.