Lanthanum Hexaboride Plate Description
Since the ratio of lanthanum to boron is less than 1:4, LaB6 is considered a boron‐rich material. Compared with other boride ceramics, the Lanthanum Hexaboride plate offers additional applications. This material can be processed into simple shapes to serve as a cathode and as a crucible for the electro‐industry and for preliminary research.

Lanthanum Hexaboride Plate Specifications
Product
|
Lanthanum Hexaboride
|
Structure
|
Polycrystalline
|
Symbol
|
LaB
|
Thermal Conductivity
|
47 W/mK (20℃)
|
CAS No.
|
12008-21-8
|
Thermal Expansion
|
6.2 10-6 K-1 (20–900℃)
|
Atomic Mass
|
203.78 g/mol
|
Electrical Resistivity
|
ca.15 μΩ cm (20℃)
|
Density
|
4.72 g/cm3
|
Electrical Conductivity
|
6.65×104 S/cm (20℃)
|
Melting Point
|
2528 K
|
Current Density
|
150 A/cm2 (1950℃)
|
Hardness
|
87.5 RA
|
Electron Emission Work Function
|
2.6 eV
|
Flexural Strength (σ)
|
200 MPa
|
Fracture Toughness (Kic)
|
3.0 MN/m3/2
|
Chemical Composition
LaB (% min.)
|
99.9%
|
B (% min.)
|
31%
|
Rare Earth Impurities
|
Non-RE Impurities
|
Ce
|
<120ppm
|
Fe
|
<250ppm
|
Pr
|
<150ppm
|
Si
|
<100ppm
|
Nd
|
<180ppm
|
Ca
|
<90ppm
|
Sm
|
<112ppm
|
C
|
<300ppm
|
Y
|
<250ppm
|
Mg
|
<100ppm
|
|
|
Ti
|
<100ppm
|
Lanthanum Hexaboride Plate Applications
* Thermionic Emission (Cathode)
* Plasma Source for Plasma-Enhanced Chemical Vapour Deposition (PECVD)
* Vacuum Electron Beam Welding Equipment
* Electron Beam Surface Forming Equipment
* Electron Beam Lithography Equipment
* Transmission Electron Microscope
* Scanning Electron Microscope
* Surface Analysis Equipment
* Radiation Therapy Equipment

Lanthanum Hexaboride Plate Packaging
The LaB ceramics from SAM are handled with care in order to minimise damage during storage and transport, thereby preserving the quality of the products in their original condition.

The prototyping service is also available for other ceramic materials
Earthenware
Aluminium Nitride
Boron Nitride
Silicon Carbide
Silicon Nitride
Zirconium Dioxide
