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  • ST0035 Platinum (Pt) Sputtering Target

    • ST0035 Platinum (Pt) Sputtering Target

    Catalogue Number ST0035
    Composition Pt
    CAS Number 7440-06-4
    Purity ≥99%
    Shape Discs, or Custom-made
    Diameter 2", 3", 4", 5", 6", or customized
    Thickness 0.25", 0.125", or customized
    Bond Type Copper, or customized
    Synonyms Platinum Sputtering Target, Pt Target

    Stanford Advanced Materials (SAM) offers high-purity Platinum (Pt) Sputtering Targets (≥99%) engineered for demanding thin film deposition processes. Platinum's exceptional chemical stability and oxidation resistance make it the preferred choice for semiconductor manufacturing, microelectronics, and advanced research applications. Our Pt sputtering targets undergo vacuum melting and precision machining to achieve a fine-grain structure and high density, which ensures consistent sputtering performance and uniform film deposition. Available in standard disc geometries or custom configurations, with copper bonding options for optimised thermal management during DC sputtering.

    Related Products: Rhodium (Rh) Sputtering Target, Palladium (Pd) Sputtering Target, Iridium (Ir) Sputtering Target

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    FAQ

    Q: What is the difference between Platinum and Pt sputtering targets?

    A: They are the same material. "Pt" is the chemical symbol for Platinum. Both terms refer to our high-purity platinum sputtering targets.

    Q: What is the lead time for a custom Platinum sputtering target?

    A: The typical lead time for custom sizes is 2-3 weeks following order confirmation. Standard disc sizes (51mm-152mm) may dispatch sooner. Please contact us for the current stock status.

    Q: Do you recommend bonding Platinum targets to a backing plate?

    A: For DC sputtering at higher power densities, we recommend bonding to a copper backing plate using indium or elastomer to enhance thermal management and prevent target cracking.

    Q: What is the difference between 99% and 99.99% purity Pt targets?

    A: 99% purity is suitable for most optical and decorative coatings. 99.99% (4N) purity is recommended for semiconductor and advanced research applications where trace elements may affect film performance.

    Q: Can you provide the typical sputtering rate for your Platinum target?

    A: Sputtering rates depend on your specific tool and parameters. Our technical team can provide reference rates based on your target size and power supply. Please include your system details with your inquiry.

    Related Products

    Catalog No. Shape Form
    ST10712 Rotary Target

    LAST RECOMMENDATION

    https://www.samaterials.com/images/sc/1768529895-normal-ST0007.jpg
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    ST0036 Praseodymium (Pr) Sputtering Target
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    NB0036 Niobium target disc, Nb target disc
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    Send us an inquiry today to learn more and receive the latest pricing. Thank you!

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    United Kingdom

      Purity

      99.9%

      • 99.9%
      • 99.5%
      • 99.99%
      • 99.999%
      • Other
      Diameter

      2''

      • 2''
      • 3''
      • 4''
      • 5''
      • 6''
      • Other
      Thickness

      0.25''

      • 0.25''
      • 0.125''
      • All
      • Other
      Bonding

      Yes

      • Yes
      • No
      • Other
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