ST0197 Titanium Dioxide (TiO₂) Sputtering Target

Titanium Dioxide (TiO₂) Sputtering Target Description

The Titanium Dioxide (TiO₂) Sputtering Target is manufactured to the highest standards with a purity of ≥99%, ensuring excellent performance in sputtering applications. Produced in disc form or custom-made as per customer specifications, this target offers outstanding thermal stability and uniformity for thin film deposition processes. It is designed for use in semiconductor manufacturing, optical coatings, and advanced electronics where precise film quality and reproducibility are essential. The target’s robust physical properties enable it to maintain integrity under high power conditions, making it a reliable choice in critical industrial settings.

Titanium Dioxide (TiO₂) Sputtering Target Applications

· Semiconductor Device Fabrication: Ensures high-quality thin films for integrated circuits and microelectronics.
· Optical Coatings: Excellent for producing reflective or anti-reflective coatings on optical components.
· Display Technologies: Utilized in the fabrication of displays and touchscreens through precise film deposition.
· Solar Cells: Ideal for creating high-efficiency layers in photovoltaic devices.
· Photocatalysis: Applied in self-cleaning surfaces and environmental purification systems.

Titanium Dioxide (TiO₂) Sputtering Target Packing

The Titanium Dioxide (TiO₂) Sputtering Target is packaged with utmost care to prevent contamination. Each target is vacuum-sealed in protective packaging, with options for 5kg bags or bulk orders based on customer requirements. Customized packaging solutions are available to ensure product integrity during transportation and storage.

Frequently Asked Questions

Q: What are the primary applications of the Titanium Dioxide (TiO₂) Sputtering Target?
A: It is mainly used for semiconductor device fabrication, optical coatings, display technologies, solar cells, and photocatalytic applications.

Q: What sputtering methods are applicable with this target?
A: The target is compatible with both RF and RF-R sputtering techniques, offering flexibility in thin film deposition processes.

Q: Is it possible to order the target in custom shapes and sizes?
A: Yes, the target is available in standard disc form as well as custom-made shapes tailored to meet specific industrial requirements.

Q: How does the high melting point benefit the target’s performance?
A: The high melting point of 1843℃ ensures thermal stability during high power sputtering, reducing the risk of deformation and prolonging the target’s operational lifespan.

Q: What storage conditions are recommended to maintain the product quality?
A: It is recommended to store the target in a cool, dry environment, ideally in its vacuum-sealed packaging, to prevent contamination and preserve its high purity.