ST0197 Titanium Dioxide (TiO2) Sputtering Target

Name: ST0197 Titanium Dioxide (TiO2) Sputtering Target
SKU: ST0197
Availability: InStock
Rating: 4.9 (166 reviews)

Catalogue Number	ST0197
Composition	TiO₂
CAS Number	13463-67-7
Purity	99.5% / 99.9% / 99.99% (customizable)
Shape	Discs, or Custom-made
Diameter	2", 3", 4", 5", 6", or customized
Thickness	0.25", 0.125", or customized
Bond Type	Copper, or customized
Synonyms	Titanium Dioxide Sputtering Target, TiO2 Target

Titanium Dioxide (TiO2) Sputtering Target is available in purity grades from 99.5% to 99.99%, with rutile or anatase crystal phase options to meet your specific thin film requirements. Our targets are manufactured using hot-pressing technology to achieve high density and fine grain size for stable, consistent sputtering performance.

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Description

Specification

SDS

Reviews

FAQ

Q: What purity grades are available for the TiO2 sputtering target?

A: We provide various purity grades to fulfil distinct application requirements: 99.5% for general industrial applications, 99.9% for electronic components, and 99.99% for semiconductor and high-end optical coatings. Custom purity levels are also available upon request.

Q: What sputtering methods are applicable with this target?

A: The target is compatible with both RF and RF-R sputtering techniques, offering flexibility in thin film deposition processes.

Q: Is it possible to order the target in custom shapes and sizes?

A: Yes, the target is available in standard disc form as well as custom-made shapes tailored to meet specific industrial requirements.

Q: How does the high melting point benefit the target’s performance?

A: The high melting point of 1843℃ ensures thermal stability during high power sputtering, thereby reducing the risk of deformation and prolonging the target’s operational lifespan.

Q: What storage conditions are recommended to maintain the product quality?

A: It is recommended to store the target in a cool, dry environment, ideally in its vacuum-sealed packaging, to prevent contamination and preserve its high purity.

LAST RECOMMENDATION

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Parameter	Value
Purity	99.5% / 99.9% / 99.99% (customisable)
Crystal Phase	Rutile (standard), Anatase (available)
Theoretical Density	4.23 g/cm³ (rutile)
Actual Density	≥ 4.2 g/cm³ (≥ 99% of theoretical)
Grain Size	≤ 10 µm
Shape	Disc, Rectangular, or Custom
Diameter	2", 3", 4", 5", 6" (up to 12" available)
Thickness	0.125", 0.25" (up to 0.5" available)
Surface Finish	Ground, Ra ≤ 1.6 µm
Bonding	Indium bonding to copper backing plate (standard)
Sputtering Method	RF, DC, or Pulsed DC

Parameter	Specification
Material	Titanium Dioxide
Symbol	TiO₂
Colour/Appearance	White, Opaque
Melting Point	1843℃
Density	4.23 g/cm³
Sputter	RF, RF-R
Type of Bond	Indium, Elastomer
Available Sizes	Customised

ST0197 Titanium Dioxide (TiO2) Sputtering Target

Titanium Dioxide (TiO2) Sputtering Target Description

Titanium Dioxide (TiO2) Sputtering Target Specifications

Titanium Dioxide (TiO2) Sputtering Target Applications

Titanium Dioxide (TiO2) Sputtering Target Packing

Specification

SDS

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Case

CUSTOMER REVIEWS

FAQ

Q: What purity grades are available for the TiO2 sputtering target?

Q: What sputtering methods are applicable with this target?

Q: Is it possible to order the target in custom shapes and sizes?

Q: How does the high melting point benefit the target’s performance?

Q: What storage conditions are recommended to maintain the product quality?

LAST RECOMMENDATION

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