Description
Nickel-Vanadium (Ni/V) vapour deposition materials are essential components used in physical vapour deposition processes. They comprise a blend of Nickel and Vanadium. They are employed in thin film deposition for electronic, optical and industrial applications. The material exhibits thermal stability with a melting point ranging from 1455℃ to 1910℃, and an electrical conductivity between 4.48×10^4 S/m and 14.3×10^4 S/m. Their composition and measured deposition characteristics conform to strict quantitative quality standards, given that these data support their use in advanced research and industrial processes. Data supporting performance is provided in the specifications below.
Specification
Materials
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Nickel-Vanadium
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Density
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6,11–8,90 g/cm³
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Melting Point
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1455–1910℃
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Thermal Conductivity
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30,7–90,9 W/m-K
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Electrical Conductivity
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4,48–14,3×10^4 S/m
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Purity
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99.9%
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Applications
1. Electronic Devices: Nickel-Vanadium (Ni/V) vapour deposition materials are used to fabricate metallisation layers, thin film resistors and connectors for integrated circuits.
2. Optical Coatings: They are applied in the manufacture of mirrors, optical filters and anti-reflective coatings that enhance the performance of optical components.
3. Magnetic Materials: Their Vanadium content permits the fabrication of magnetic storage media and magnetic sensors.
4. Industrial Applications: They are used to deposit wear-resistant and corrosion-resistant coatings that extend component service life.
Packaging
Our Nickel-Vanadium (Ni/V) vapour deposition materials are clearly labelled and externally marked for effective tracking. Additional measures ensure that no mechanical damage occurs during storage or transport.