Nickel-Silicid Evaporation Materials Description
Nickel-Silicid (NiSi2) evaporation material is a ceramic silicide evaporation material. Highly pure NiSi2 evaporation materials play an important role in deposition processes, thereby ensuring the production of high-quality films.
The Nickel-Silicid evaporation material offered by Stanford Advanced Materials is a silicide-ceramic evaporation material with the chemical formula NiSi2. Highly pure NiSi2 evaporation materials play an important role in deposition processes and ensure the production of high-quality deposited layers. Stanford Advanced Materials (SAM) manufactures evaporation materials with a purity of up to 99,9995% and employs rigorous quality-assurance processes, thereby ensuring consistent product performance.
Specifications for Nickel-Silicid Evaporation Materials
Material Type |
Nickel-Silicid |
Symbol |
NiSi2 |
Melting Point |
1 255 °C (2 291 °F; 1 528 K) |
Density |
7,40 g/cm3 |
Purity |
99.9% |
Form |
Powder/Granulate/Custom fabrication |
Applications for Nickel-Silicid Evaporation Materials
Nickel-Silicid evaporation materials are used widely in deposition processes, including semiconductor deposition, chemical vapour deposition (CVD) and physical vapour deposition (PVD). They are primarily applied in optics, where they provide wear protection and decorative coatings, thereby contributing to display technology.
Packaging of Nickel-Silicid Evaporation Materials
To ensure systematic identification and quality control, the Nickel-Silicid evaporation materials are carefully labelled and provided with an outer label. Extreme care is taken to avoid potential damage during storage or transport.