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  • AC5591 Electrostatic Chuck (Al2O3, SiO2, MgO)

    • AC5591 Electrostatic Chuck (Al2O3, SiO2, MgO)

    Catalogue Number AC5591
    Main Composition Al2O3, SiO2, MgO
    Dimensions Dia. 300 mm, etc.
    Density 3.77 g/cm3
    Al2O3 Content 96%

    Electrostatic Chucks are a crucial component of semiconductor manufacturing equipment, particularly in plasma etching, CVD, and PVD processes. Stanford Advanced Materials (SAM) has extensive experience in the manufacture and supply of high-quality electrostatic chucks.

    Related Products: Electrostatic Chuck (Al2O3, AlN, Sapphire), Electrostatic Chuck (Al2O3)

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