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CY3451 Cu Coated Ta/SiO2 Silicon Wafer

Catalogue Number CY3451
Composition Cu, Ta, SiO2
Purity >99.99%
Dimensions 2, 4, 6, 8, 12” dia 0.525mm thickness
Orientation Cu <111>

Cu-coated Ta/SiO2 Silicon Wafers can be utilised in the nanoscale, in Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), and other scanning probe microscopies. Stanford Advanced Materials (SAM) possesses extensive experience in the manufacture and supply of high-quality optical products.

Related products: Ti-coated SiO2/Si Substrate, Ni-coated SiO2/Si Substrate, Gold-plated Silicon Wafers, Pt-coated Silicon Wafers, Ag-coated Silicon Wafers

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