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  • CY3451 Cu Coated Ta/SiO2 Silicon Wafer

    • CY3451 Cu Coated Ta/SiO2 Silicon Wafer

    Catalogue Number CY3451
    Composition Cu, Ta, SiO2
    Purity ＞99.99%
    Dimensions 2, 4, 6, 8, 12” dia 0.525mm thickness
    Orientation Cu <111>

    Cu-coated Ta/SiO2 Silicon Wafers can be utilised in the nanoscale, in Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), and other scanning probe microscopies. Stanford Advanced Materials (SAM) possesses extensive experience in the manufacture and supply of high-quality optical products.

    Related products: Ti-coated SiO2/Si Substrate, Ni-coated SiO2/Si Substrate, Gold-plated Silicon Wafers, Pt-coated Silicon Wafers, Ag-coated Silicon Wafers

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