VD0782 Hafnium fluoride (HfF4) evaporation materials

Hafnium Fluoride Evaporation Materials Description

Examine the physical and chemical properties of Hafnium Fluoride Evaporation Materials and review their range of applications across various industrial sectors. This page provides detailed, factual information concerning the primary properties, applications and measured benefits of using Hafnium Fluoride in thin-film coating processes.

Hafnium Fluoride Evaporation Materials Specification

Main Features of Hafnium Fluoride Evaporation Materials

• Chemical Composition: Hafnium Fluoride (HfF4) contains Hafnium (Hf) and Fluorine (F) and is produced as a white crystalline powder.

• Sublimation Point: HfF4 sublimes at 970 °C (1 780 °F; 1 240 K), thereby transitioning directly from a solid to a gaseous state during thermal evaporation without forming a liquid phase.

• Density: With a density of 7.1 g/cm³, Hafnium Fluoride exhibits a substantial mass, which contributes to its stability during thin-film deposition processes.

Applications of Hafnium Fluoride Evaporation Materials

1. Optical Coatings: Hafnium Fluoride thin films are used in optical coatings for lenses, mirrors and various optical components. Its refractive properties allow control of light transmission and reflection.

2. Semiconductors: Hafnium Fluoride is used in semiconductor manufacturing processes, particularly in thin-film gate dielectrics for High-K metal gate transistors (HKMG).

3. Protective Coatings: Owing to its high melting point and chemical stability, Hafnium Fluoride serves as a protective coating in harsh environments and high-temperature applications.

Utilise the potential of Hafnium Fluoride evaporation materials in precise industrial applications.

Packaging of Hafnium Fluoride Evaporation Materials

Our Hafnium Fluoride (HfF4) Evaporation Materials are clearly labelled to ensure effective identification and quality control. The packaging has been designed to prevent damage during storage or transport.