ST11198 Niobium Rotary Target, Nb Target

Niobium Rotary Target, Nb Target Description

Niobium Rotary Target, Nb Target is a sputtering target fabricated from chemically inert, refractory niobium (Nb). Its customised dimensions ensure compatibility with a broad range of deposition systems. The material exhibits high melting point characteristics and consistent mechanical behaviour, which are crucial for maintaining deposition rates and film uniformity. Detailed production and quality inspection methods support precise material properties for semiconductor and microfabrication applications.

Niobium Rotary Target, Nb Target Characteristics

The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Niobium Rotary Target, Nb Target Applications

1.       Electronics and Semiconductor Fabrication
   - Used as a sputtering target in semiconductor deposition to achieve uniform thin films by leveraging pure niobium's chemical inertness.
   - Applied as a coating source in integrated circuit manufacturing to support precise film thickness control through consistent target composition.

2.       Industrial Coating Processes
   - Serves as the material basis for physical vapour deposition systems to form wear-resistant coatings, leveraging the high melting point of niobium.
   - Employed in decorative or functional coating applications in industrial equipment where controlled film structure enhances performance.

Niobium Rotary Target, Nb Target Packing

Niobium Rotary Target, Nb Target is packaged in a sealed, anti-static container within a cushioned foam-lined box to prevent physical damage and contamination. Protective sealing ensures minimal exposure to humidity and particulates. The packaging design permits customisation for size and labelling, and storage guidelines recommend a clean, temperature-controlled environment to preserve material integrity before installation.

Additional Information

Niobium is a refractory metal known for its excellent corrosion resistance and high melting point, attributes that make it suitable for high-temperature processing. These characteristics are vital when producing sputtering targets intended for thin film application in electronics and semiconductor devices. The performance of deposition processes is closely linked to substrate and target purity, influencing film uniformity and processing yield.

In the broader context of materials science, niobium's mechanical and thermal properties are extensively studied to optimise its use in advanced coating and surface engineering. Understanding these properties aids in tailoring processing parameters in industrial environments and enhancing overall system performance.