ST11219 Zinc Planar Target, Zn Target

Zinc Planar Target, Zn Target Description

Zinc Planar Target, Zn Target is a sputtering target composed of elemental zinc (Zn) prepared in a planar form with customised dimensions. The controlled configuration aids in achieving uniform thin film deposition in physical vapour deposition systems. The inherent material properties of zinc, including its known density and melting point, contribute to its effectiveness in coating applications where process consistency and film uniformity are critical.

Zinc Planar Target, Zn Target Characteristics

*The above product information is based on theoretical data and is for reference only. Actual specifications may vary.

Zinc Planar Target, Zn Target Applications

1.       Electronics
   - Used as a deposition source in semiconductor manufacturing to achieve uniform thin films by leveraging its controlled planar geometry. This ensures minimal film thickness variations, critical for integrated circuit fabrication.

2.       Industrial Coatings
   - Applied as a target material in physical vapour deposition systems to form corrosion-resistant coatings on metal surfaces. Its customised dimensions allow for precise control of coating uniformity, which contributes to extended component life.

3.       Optoelectronics
   - Functions as a target in sputtering processes for creating conductive layers in display technologies. Its consistent material properties facilitate controlled film formation, enhancing the performance of light-emitting devices.

Zinc Planar Target, Zn Target Packing

Zinc Planar Target, Zn Target is packaged in cleanroom-grade, anti-static materials and sealed within moisture-resistant, cushioned containers to minimise mechanical impact during shipment. Storage in a climate-controlled environment with low humidity is recommended to prevent oxidation. Custom packaging options, including modified compartmentalisation and labelling, are available based on specific dimensional and handling requirements.

Additional Information

Zinc planar targets play a pivotal role in thin film deposition techniques, especially in physical vapour deposition systems. The controlled material properties, such as density and melting point, directly influence the uniformity and adhesion of the deposited films. Understanding the interplay between target characteristics and film performance aids in optimising process parameters in electronic and industrial applications.

Advances in materials science continue refining target fabrication techniques, emphasising the importance of surface integrity and dimensional accuracy. This progress not only enhances deposition efficiency but also supports the development of novel coatings and layered structures across multiple technologies.