ST11220 Zinc Rotary Target, Zn Target

Catalogue Number	ST11220
Composition	Zn
Purity	≥99.99%, or customized
Form	Target
Shape	Tubular
Dimensions	Customized

Zinc Rotary Target, Zn Target is produced using a controlled rotary processing method to achieve even surface erosion during sputtering. Stanford Advanced Materials (SAM) applies optical emission spectroscopy for in-line composition verification and impurity control. This approach minimises material variation and supports strict dimensional consistency, ensuring the target meets the specific operational requirements for high-performance sputtering processes.

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FAQ

How does the rotational design of the target influence film uniformity?

The target's rotation promotes even erosion across its surface, which reduces thickness variations in the deposited film. This effect is essential for achieving uniform coatings on large substrates. Contact us for detailed operational parameters.

What quality control measures confirm zinc purity during production?

Production utilises optical emission spectroscopy and X-ray fluorescence analysis to verify elemental composition and purity levels. These methods ensure the zinc meets strict material specifications suitable for sputtering applications.

Can target dimensions be adapted to suit different sputtering systems?

Yes, the design supports customisation of dimensions to fit various equipment configurations, facilitating integration into diverse sputtering setups without compromising the target’s performance.

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