What Is Sputtering?
Sputtering is a process in which a gas plasma dislodges atoms from the surface of a solid Zielmaterials. The atoms subsequently deposit and form a very thin film on the surfaces of substrates. This technique is used to deposit thin films on semiconductors, CDs, hard drives and optical devices. Sputtered films demonstrate uniformity, density, purity and adhesion. Conventional sputtering produces alloys with a precise composition, whereas reactive sputtering is used to create oxides, nitrides and other compounds.
Process of sputtering:
- Ions from an inert gas are accelerated towards the target.
- Energy transfer from the ions erodes the target, thereby releasing neutral particles.
- Neutral particles from the target migrate and deposit as a thin film on the substrate surface.
Bars
Beads & Spheres
Bolts & Nuts
Crucibles
Discs
Fibers & Fabrics
Films
Flake
Foams
Foil
Granules
Honeycombs
Ink
Laminate
Lumps
Meshes
Metallised Film
Plate
Powders
Rod
Sheets
Single Crystals
Sputtering Target
Tubes
Washer
Wires
Converters & Calculators
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